机读格式显示(MARC)

• 000 01114nam2 2200337 4500

• 000 1000006373

• 001 0000162724

• 003 CAL

• 005 20050120081925.0

• 008 981216s1980 ne a b 00100 eng d

• 010 __ |a 80013154

• 020 __ |a 0444853510 |c CNY2.70

• 040 __ |a XAIT |c XAIT

• 050 00 |a TK7874 |b .F56

• 082 00 |a 621.381/73

• 090 __ |a TN47/E13

• 093 __ |a TN47 |2 4

• 099 __ |a CAL 022000330943

• 245 00 |a Fine line lithography / |c edited by Roger Newman.

• 260 __ |a Amsterdam ; |a New York : |b North-Holland Pub. Co. ; |a New York : |b sole distributor for the USA and Canada, Elsevier North-Holland, |c 1980.

• 300 __ |a vii, 481 p. ; |c 23 cm.

• 440 _0 |a Materials processing, theory and practices ; |v v. 1

• 504 __ |a Includes bibliographies and index.

• 650 _0 |a Lithography.

• 650 _0 |a Integrated circuits |x Large scale integration.

• 700 1_ |a Newman, Roger.

• 905 __ |a XATU |d TN47/E13

• 920 __ |a 261060 |z 1

• 950 __ |a 261060 |f TN47/E13

• 991 __022005002373

• 999 __ |t C |A zhaining |a 20050120 08:17:45 |M zhaining |m 20050120 08:19:25 |G zhaining |g 20050120 08:19:4