机读格式显示(MARC)

• 000 01586nam2 2200385 4500

• 000 1000001748

• 001 0000158241

• 003 CAL

• 005 20040707085602.0

• 008 981214s1984 nyua b 00110 eng

• 020 __ |a 0306418037 |c CNY298.15

• 040 __ |c SJT |a XAIT

• 050 0_ |a TK7874 |b .I5924 1982

• 082 0_ |a 621.381/7 |2 19

• 090 __ |a TN4-53/13:(82)E

• 093 __ |a TN4-53 |2 3

• 099 __ |a CAL 022000308149

• 111 2_ |a International Symposium on Methods and Materials in Microelectronic Technology |d (1982 : |c Bad Neuenahr-Ahrweiler, Germany)

• 245 10 |a Methods and materials in microelectronic technology / |c edited by Joachim Bargon.

• 260 __ |a New York : |b Plenum Press, |c c1984.

• 300 __ |a viii, 367 p. : |b ill. ; |c 26 cm.

• 440 _4 |a The IBM research symposia series

• 500 __ |a "Proceedings of the International Symposium on Methods and Materials in Microelectronic Technology, held September 29-October 1, 1982, in Bad Neuenahr, Federal Republic of Germany"--T.p. verso.

• 504 __ |a Includes bibliographies and index.

• 650 _0 |a Photolithography |x Congresses.

• 650 _0 |a Ion beam lithography |x Congresses.

• 650 _0 |a X-ray lithography |x Congresses.

• 650 _0 |a Integrated circuits |x Very large scale integration |x Design and construction |x Congresses.

• 700 10 |a Bargon, Joachim.

• 740 01 |a Microelectronic technology.

• 905 __ |a XATU |d TN4-53/13:(82)E

• 920 __ |a 261060 |z 1

• 950 __ |a 261060 |f TN4-53/13:(82)

• 991 __022004001758

• 999 __ |t C |A zhouwei |a 20040707 08:54:50 |I zhouwei |i 20040707 08:56:02 |G zhouwei |g 20040707 08:56:3